Overview of etching technologies used for HgCdTe

Opto-Electronics Review

Volumn 13, Issue 3, 2005, Pages 197-211

  Srivastav, V ^a   Pal, R ^a   Vyas, H P ^a  

^a SOLID STATE PHYSICS LABORATORY   (India)

Author keywords

ECR plasma system and etch lag; Mesa etching; Wet and dry etching

Indexed keywords

ASPECT RATIO; CADMIUM ALLOYS; CYCLOTRONS; DRY ETCHING; ELECTRON CYCLOTRON RESONANCE; II-VI SEMICONDUCTORS; INDUCTIVELY COUPLED PLASMA; MERCURY AMALGAMS; PLASMA DEVICES; SEMICONDUCTOR ALLOYS;

DRY ETCHING TECHNIQUES; ECR PLASMA SYSTEM; ELECTRON CYCLOTRON RESONANCE PLASMA; ETCH-INDUCED DAMAGE; HIGH ASPECT RATIO TRENCHES; MESA ETCHING; MULTI-SPECTRAL DETECTOR; WET AND DRY ETCHINGS;

WET ETCHING;

EID: 27644578866     PISSN: 12303402     EISSN: 18963757     Source Type: Journal    
DOI: None     Document Type: Review

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