메뉴 건너뛰기




Volumn 33, Issue 6, 2004, Pages 543-551

Determination of the ion angular distribution for electron cyclotron resonance, plasma-etched HgCdTe trenches

Author keywords

Anisotropy; Aspect ratio; Electron cyclotron resonance (ECR); Etch bias; Hgcdte; Ion angular distribution (IAD)

Indexed keywords

ANISOTROPY; ASPECT RATIO; AUGER ELECTRON SPECTROSCOPY; COSINE TRANSFORMS; ELECTRON CYCLOTRON RESONANCE; ION BEAM ASSISTED DEPOSITION; MOLECULAR BEAM EPITAXY; PHOTODIODES; PHOTORESISTS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; THICK FILMS; TWINNING;

EID: 3042792753     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-004-0044-7     Document Type: Conference Paper
Times cited : (16)

References (30)
  • 12
    • 3042772655 scopus 로고    scopus 로고
    • Resists were from the Clariant Corp., Somerville, NJ
    • Resists were from the Clariant Corp., Somerville, NJ.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.