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Journal of Electronic Materials

Volumn 31, Issue 7, 2002, Pages 822-826

Effect of photoresist-feature geometry on electron-cyclotron resonance plasma-etch reticulation of HgCdTe diodes

(7) Benson, J D a Stoltz, A J b Kaleczyc, A W b Martinka, M a Almeida, L A a Boyd, P R c Dinan, J H a

a NIGHT VISION AND ELECTRONIC SENSORS DIRECTORATE (United States)

b E OIR Measurements (United States)

c U S ARMY RESEARCH LABORATORY (United States)

Author keywords

CdZnTe; Electron cyclotron resonance; HgCdTe; Isolation trench; Sidewall aspect ratio

Indexed keywords

ANISOTROPY; ASPECT RATIO; ELECTRON CYCLOTRON RESONANCE; PHOTODIODES; PHOTOLITHOGRAPHY; PHOTORESISTS; PLASMA ETCHING; SEMICONDUCTING CADMIUM COMPOUNDS;

WET CHEMICAL ETCHING;

MERCURY COMPOUNDS;

EID: 0036637873 PISSN: 03615235 EISSN: None Source Type: Journal
DOI: 10.1007/s11664-002-0244-y Document Type: Article

Times cited : (18)

References (20)

1
- 0004175815
- New York: Wiley Interscience
- (1989) Photoreactive Polymers: The Science and Technology of Resists , pp. 1-57
- Reisner, A.¹

2
- 0003957801
- ed. R.K. Willardson and A.C. Beer (New York: Academic Press)
- (1970) Semiconductors and Semimetals , vol.5 , pp. 244-251
- Long, D.¹ Schmit, J.L.²

3
- 0035360005
- (2001) J. Electron. Mater. , vol.30 , pp. 590
- Tennant, W.E.¹ Thomas, M.² Kozlowski, L.J.³ McLevige, W.V.⁴ Edwall, D.D.⁵ Zandian, M.⁶ Spariosu, K.⁷ Hildebrandt, G.⁸ Gil, V.⁹ Ely, P.¹⁰ Muzilla, M.¹¹ Stoltz, A.¹² Dinan, J.H.¹³

4
- 0001765754
- (1998) J. Electron. Mater. , vol.27 , pp. 747
- Rajavel, R.D.¹ Jamba, D.M.² Jensen, J.E.³ Wu, O.K.⁴ Brewer, P.D.⁵ Wilson, J.A.⁶ Johnson, J.L.⁷ Patten, E.A.⁸ Kosai, K.⁹ Caulfield, J.T.¹⁰ Goetz, P.M.¹¹

5
- 0032643212
- (1999) J Cryst. Growth , vol.201 , pp. 980
- De Lyon, T.J.¹

6
- 0032657527
- (1999) J. Electron. Mater , vol.28 , pp. 821
- O'Dette, P.¹ Tarnowski, G.² Lukach, V.³ Krueger, M.⁴ LoVecchio, P.⁵

7
- 0035360044
- (2001) J. Electron. Mater. , vol.30 , pp. 733
- Stoltz, A.J.¹ Banish, M.R.² Dinar, J.H.³ Benson, J.D.⁴ Brown, D.R.⁵ Chenault, D.B.⁶ Boyd, P.R.⁷

8
- 0000740263
- (1993) Appl. Phys. Lett. , vol.62 , pp. 976
- Arias, J.M.¹ Pasco, J.G.² Zandian, M.³ Shin, S.H.⁴ Williams, G.M.⁵ Bubulac, L.O.⁶ Dewames, R.E.⁷ Tennant, W.E.⁸

9
- 0033702186
- (2000) J. Electron. Mater. , vol.29 , pp. 754
- Almeida, L.A.¹ Dhar, N.K.² Martinka, M.³ Dinan, J.H.⁴

10
- 0005585543
- ed. D.C. O'Shea (Bellingham, WA: SPIE)
- (1993) SPIE Tutorial Texts , vol.TT 11 , pp. 97-124
- Dammel, R.¹

11
- 0003852994
- New York: Plenum Press
- (1988) Semiconductor Lithography - Principles, Practices, and Materials , pp. 557-566
- Moreau, W.A.¹

12
- 85011873744
- Resists were from the Clariant Corporation, Somerville, NJ

13
- 0001405046
- (1997) J. Electron. Mater. , vol.26 , pp. 534
- Hirsch, L.S.¹ Yu, Z.² Buczkowski, S.L.³ Myers, T.H.⁴ Richards-Babb, M.R.⁵

14
- 0000435502
- (1998) J. Electron. Mater. , vol.27 , pp. 657
- Johnson, J.N.¹ Almeida, L.A.² Benson, J.D.³ Dinan, J.H.⁴ Martinka, M.⁵

15
- 0032690732
- (1999) J. Electron. Mater. , vol.28 , pp. 817
- Johnson, J.N.¹ Almeida, L.A.² Martinka, M.³ Benson, J.D.⁴ Dinan, J.H.⁵

16
- 0000137368
- (1997) J. Electron. Mater. , vol.26 , pp. 542
- Keller, R.C.¹ Zimmerman, H.² Seelmann-Eggebert, M.³ Richter, H.J.⁴

17
- 0033116905
- (1999) J. Electron. Mater. , vol.28 , pp. 347
- Eddy, C.R.¹ Leonhardt, D.² Shamamian, V.A.³ Meyer, J.R.⁴ Hoffman, C.A.⁵ Butler, J.E.⁶

18
- 0019528177
- (1981) J. Electrochem. Soc. , vol.128 , pp. 366
- Adams, A.C.¹ Capio, C.D.²

19
- 85011813777
- in this issue
- Stoltz, A.J.¹ Benson, J.D.² Thomas, M.³ Boyd, P.R.⁴ Martinka, M.⁵ Dinan, J.H.⁶

20
- 0018445030
- (1979) J. Vac. Sci. Technol. , vol.16 , pp. 164
- Lee, R.E.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.