Development of imprint materials for the step and flash imprint lithography process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 232-241

  Xu, Frank ^a   Stacey, Nick ^b   Watts, Mike ^a   Van Truskett, ^a   McMackin, Ian ^a   Choi, Jin ^a   Schumaker, Philip ^a   Thompson, Ecron ^a   Babbs, Dan ^a   Sreenivasan, S V ^a   Willson, Grant ^b   Schumaker, Norman ^a  

^a MOLECULAR IMPRINTS INC   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLASH IMPRINT LITHOGRAPHY; IMPRINT MATERIALS; MONOMER MIXTURES; PATTERN DENSITY;

ADHESION; CROSSLINKING; INTERFACES (MATERIALS); MONOMERS; PHASE SEPARATION; VISCOSITY;

LITHOGRAPHY;

EID: 3843056766     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.538734     Document Type: Conference Paper

References (5)

1. S.Y. Chou, P.R. Krauss, P.J. Renstrom, "Nanoimprint lithography," J. Vac. Sci., Tech. B, 1996. 14(6).
2. Mathew Colburn, Todd Bailey, Byung Jin Choi, John G. Ekerdt, S.V. Sreenivasan, C. Grant Willson, "Step and Flash Imprint Lithography," Solid State Technology, July 2001.
3. D. J. Resnick, W. J. Dauksher, D. Mancini, K. J. Nordquist, E. Ainley, K. Gehoski, J. H. Baker, T. C. Bailey, B. J. Choi, S. Johnson, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, "High Resolution Templates for Step and Flash Imprint Lithography," J. Microlith., Microfab., Microsyst., Vol. 1 No. 3, October 2002.
4. M. Bender et al., "Multiple Imprinting in UV based Nanoimprint Lithography: Related Materials Issues," Microelectronic Engineering, 61-62 (2002), pp. 407-413.
5. Taniguchi et al., Japanese Journal of Applied Physics, Part 1, Vol. 40, 2002. beginning at page 4194.