Improved step and flash imprint lithography templates for nanofabrication

Microelectronic Engineering

Volumn 69, Issue 2-4, 2003, Pages 412-419

  Resnick, D J ^a   Mancini, D ^a   Dauksher, W J ^a   Nordquist, K ^a   Bailey, T C ^b   Johnson, S ^b   Sreenivasan, S V ^b   Ekerdt, J G ^b   Willson, C G ^b  

^a MOTOROLA INC   (United States)

^b The University of Texas at Austin   (United States)

Author keywords

Flash; Imprint; Lithography; Step

Indexed keywords

ETCHING; LITHOGRAPHY; NANOTECHNOLOGY; SEMICONDUCTING INDIUM COMPOUNDS; SUBSTRATES;

FLASH IMPRINT;

MICROELECTRONIC PROCESSING;

EID: 0141791624     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00329-0     Document Type: Conference Paper

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