Design and performance of a step and repeat imprinting machine

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 178-186

  McMackin, Ian ^a   Schumaker, Philip ^a   Babbs, Daniel ^a   Choi, Jin ^a   Collison, Wenli ^b   Sreenivasan, S V ^a   Schumaker, Norman ^a   Watts, Michael ^a   Voisin, Ronald ^a  

^a MOLECULAR IMPRINTS INC   (United States)

^b LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DATA ACQUISITION; ETCHING; GLASS TRANSITION; SILICON WAFERS; SYSTEMS ANALYSIS; TEMPERATURE; THERMAL PRINTING; THICKNESS CONTROL;

CRITICAL DIMENSION; FIELD EDGE CONTROL; FIELD TO FIELD ALIGNMENT; IMPRINTING MACHINE; LEVEL TO LEVEL ALIGNMENT TARGET ACQUISITION; STEP AND FLASH IMPRINT LITHOGRAPHY;

LITHOGRAPHY;

EID: 0141724812     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.490133     Document Type: Conference Paper

References (9)

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2. S.Y. Chou, P.R. Krauss, P.J. Renstrom, "Nanoimprint lithography," J. Vac. Sci., Tech. B, 1996. 14(6).
3. Mathew Colburn, Todd Bailey, Byung Jin Choi, John G. Ekerdt, S.V. Sreenivasan, C. Grant Willson, "Step and Flash Imprint Lithography," Solid State Technology, July 2001.
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6. M. Bender et al., "Multiple Imprinting in UV based Nanoimprint Lithography: Related Materials Issues," Microelectronic Engineering, 61-62 (2002), pp. 407-413.
7. B. J. Choi, S. Johnson, M. Colburn, S.V. Sreenivasan, C. G. Willson, "Design of Orientation Stages for Step and Flash Imprint Lithography," Journal of Int. Societies for Precision Engineering and Nanotechnology, Volume 25, No. 3, pp. 192-199, July, 2001.
8. Ecron Thompson et al., "Fabrication of Step and Flash Imprint Lithography Templates Using Commercial Mask Processes," Proc. of the SPIE's Int. Symp. on Microlithography: Emerging Lithographic Technologies VII, Santa Clara, CA, February 2003 (to appear).
9. S. C. Johnson et al., "Step and Flash Imprint Lithography: Materials and Process Development," Proceedings of the SPIE's International Symposium on Microlithography: Emerging Lithographic Technologies VII, Santa Clara, CA, February 2003 (to appear).