Inspection and repair issues for Step and Flash Imprint Lithography templates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 2, 2004, Pages 853-863

  Nordquist, Kevin J ^a   Dauksher, William J ^a   Mancini, David P ^a   Resnick, Douglas J ^a   Hess, Harald ^b   Pettibone, Don ^b   Adler, David ^b   Bertsche, Kirk ^b   White, Roy ^c   Csuy, Jeff ^c   Lee, David ^c  

^a MOTOROLA INC   (United States)

^b KLA TENCOR CORPORATION   (United States)

^c RAVE LLC   (United States)

Author keywords

Flash; Imprint; Lithography; Step; Template

Indexed keywords

IMPRINT LITHOGRAPHY; STEP AND FLASH IMPRINT LITHOGRAPHY (S-FIL); SURFACE CHARGING; TEMPLATES;

ANTIREFLECTION COATINGS; DEFECTS; MASKS; MATHEMATICAL MODELS; MONOMERS; REPAIR;

PHOTOLITHOGRAPHY;

EID: 21144464013     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569846     Document Type: Conference Paper

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