Iron contamination in silicon wafers measured with the pulsed MOS capacitor generation lifetime technique

IEEE Transactions on Electron Devices

Volumn 47, Issue 12, 2000, Pages 2392-2398

  Tan, Suat Eng ^a   Schröder, Dieter K ^a   Kohno, Motohiro ^a   Miyazaki, Morimasa ^a  

^a Arizona State University   (United States)

Author keywords

Impurities; Mos capacitors; Semiconductor materials; Semiconductors; Semicondutctor device measurements; Silicon

Indexed keywords

EID: 1942463142     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.887027     Document Type: Article

References (34)

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