Breakdown in silicon oxides (II) - Correlation with Fe precipitates

Applied Physics Letters

Volumn 46, Issue 6, 1985, Pages 582-584

  Honda, Kouichirou ^a   Ohsawa, Akira ^a   Toyokura, Nobuo ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

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Indexed keywords

EID: 0000561824     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.95547     Document Type: Article

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