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Volumn 116, Issue 1-3, 1983, Pages 297-300

Electronically controlled reactions of interstitial iron in silicon

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON;

EID: 21544463903     PISSN: 03784363     EISSN: None     Source Type: Journal    
DOI: 10.1016/0378-4363(83)90263-2     Document Type: Article
Times cited : (185)

References (18)
  • 9
    • 0020114123 scopus 로고
    • Interstitial iron and iron-acceptor pairs in silicon
    • v ≅ 0.39eV by reference 7 and by, This level is spectroscopically denoted H(0.46) in this work, reflecting the observed activation energy for hole emission to the valence band of 0.46 eV. This activation energy corresponds to the approximate level position.
    • (1982) Applied Physics A Solids and Surfaces , vol.27 A , pp. 207
    • Wunstel1    Wagner2
  • 10
    • 84913767378 scopus 로고    scopus 로고
    • R = -6V.
  • 11
    • 0001304341 scopus 로고
    • - acceptor have been shown to play a role in the gettering of transition metal contaminants by high concentration phosphorus diffused region.
    • (1975) J. Phys. Chem. Sol. , vol.36 , pp. 731
    • Meek1    Seidel2
  • 14
    • 84913771281 scopus 로고    scopus 로고
    • Miller, G.L., private communication.
  • 15
    • 84913809381 scopus 로고    scopus 로고
    • Kimerling, L.C. and Benton, J.L., to be published.
  • 16
    • 84913755923 scopus 로고    scopus 로고
    • i). However, these species are not equilibrium entities. They are only observed following electron bombardment and are more correctly regarded as defect-impurity complexes.
  • 18
    • 84913782635 scopus 로고    scopus 로고
    • i) are determined to be in second neighbor positions from the extent of the initial rate. Longer times of the same injection treatment yield 100% distant pairs, confirming the phenomenon of injection stimulated diffusion of isolated interstitial iron.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.