Fabrication of masters for nanoimprint, step and flash, and soft lithography using hydrogen silsesquioxane and x-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 2685-2690

  Junarsa, Ivan ^a   Nealey, Paul F ^b  

^a University of Wisconsin Madison   (United States)

^b Center for Nanotechnology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROFABRICATION; NANOIMPRINT; NANOSCALE DIMENSIONS; STEP AND FLASH LITHOGRAPHY (SFIL);

DIELECTRIC MATERIALS; ELECTRON BEAMS; ETCHING; INTEGRATED CIRCUITS; MICROSTRUCTURE; MONOMERS; NANOSTRUCTURED MATERIALS; PHOTORESISTORS; SCANNING ELECTRON MICROSCOPY; X RAY LITHOGRAPHY;

HYDROGEN;

EID: 13244263121     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1807838     Document Type: Article

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