Substrate cooling efficiency during cryogenic inductively coupled plasma polymer etching for diffractive optics on membranes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2896-2900

  Olynick, Deirdre L ^a   Anderson, Erik H ^a   Harteneck, Bruce ^a   Veklerov, Eugene ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COOLING; CRYOGENICS; DIFFRACTIVE OPTICS; LOW TEMPERATURE EFFECTS; PLASMA APPLICATIONS; POLYMERIC MEMBRANES; SILICON WAFERS; SUBSTRATES;

COUPLED PLASMA POLYMER ETCHING; SUBSTRATE COOLING EFFICIENCY;

DRY ETCHING;

EID: 0035519844     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1414021     Document Type: Article

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