SCOPUS 정보 검색 플랫폼

Volumn 14, Issue 4, 2002, Pages 1448-1451

Site selective copper and silver electroless metallization facilitated by a photolithographically patterned hydrogen silsesquioxane mediated seed layer

(3) Harkness, Brian R a Rudolph, Michael a Takeuchi, Kasumi b

a DOW CORNING CORPORATION (United States)

b Dow Corning Asia Ltd (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; HYDROGEN; HYDROGEN SILSESQUIOXANE; SILVER; UNCLASSIFIED DRUG;

ANALYTIC METHOD; ARTICLE; CATALYSIS; COMPLEX FORMATION; MOLECULAR STABILITY; PLATING MEDIUM; REDUCTION;

EID: 0036120414 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm010373e Document Type: Article

Times cited : (12)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.