In situ Si flux cleaning technique for producing atomically flat Si(100) surfaces at low temperature

Applied Physics Letters

Volumn 70, Issue 17, 1997, Pages 2288-2290

  Wilk, G D ^a   Wei, Yi ^a   Edwards, Hal ^a   Wallace, R M ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001162919     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119083     Document Type: Article

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