Minimization of interfacial microroughness for 13-60 angstroms ultrathin gate oxides

Materials Research Society Symposium - Proceedings

Volumn 477, Issue , 1997, Pages 203-208

  Sapjeta, J ^a   Boone, T ^a   Rosamilia, J M ^a   Silverman, P J ^a   Sorsch, T W ^a   Timp, G ^a   Weir, B E ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; GATES (TRANSISTOR); INTERFACES (MATERIALS); OXIDES; SUBSTRATES; SURFACE ROUGHNESS; THERMOOXIDATION; ULTRAVIOLET RADIATION;

INTERFACIAL MICROROUGHNESS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030715182     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)