XPS analysis of FIB-milled Si

Surface and Interface Analysis

Volumn 33, Issue 12, 2002, Pages 907-913

  Ferryman, Amy C ^a   Fulghum, Julia E ^a   Giannuzzi, Lucille A ^b   Stevie, Fred A ^c  

^a KENT STATE UNIVERSITY   (United States)

^b University of Central Florida   (United States)

^c NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

FIB; Ga contamination; Si; Spectra from images; Surface oxidation; XPS

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMMINUTION; ION BEAMS; OXIDATION; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

FOCUSED ION BEAM (FIB);

SURFACE TREATMENT;

EID: 0036903673     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1448     Document Type: Article

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