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Volumn 87, Issue 3, 2001, Pages 97-104
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Surface damage formation during ion-beam thinning of samples for transmission electron microscopy
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Author keywords
Cleaving; Focused ion beam; Ion milling; TEM sample preparation
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Indexed keywords
AMORPHIZATION;
ION BEAMS;
SEMICONDUCTING SILICON;
HIGH MAGNIFICATION;
TRANSMISSION ELECTRON MICROSCOPY;
SILICON;
ARTICLE;
ARTIFACT;
ENERGY;
EQUIPMENT;
MATERIALS;
SAMPLE;
SEMICONDUCTOR;
SURFACE PROPERTY;
TECHNIQUE;
TRANSMISSION ELECTRON MICROSCOPY;
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EID: 0035051499
PISSN: 03043991
EISSN: None
Source Type: Journal
DOI: 10.1016/S0304-3991(00)00096-6 Document Type: Article |
Times cited : (220)
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References (19)
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