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Thin Solid Films

Volumn 319, Issue 1-2, 1998, Pages 101-105

TEM observation of structural differences between two types of Ni silicide/Si thin films caused by FIB irradiation

(3) Tanaka, Miyoko a Furuya, Kazuo a Saito, Tetsuya a

a NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

Author keywords

Focused ion beam irradiation; Substrate; TEM

Indexed keywords

ANNEALING; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ION BEAMS; ION BOMBARDMENT; NICKEL COMPOUNDS; PRECIPITATION (CHEMICAL); SILICON WAFERS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSED ION BEAMS (FIB); NICKEL SILICIDE;

THIN FILMS;

EID: 0346553134 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)01095-X Document Type: Article

Times cited : (3)

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