The use of Auger spectroscopy and a quadrupole SIMS build on a focused ion beam to examine focused ion beam made cross-sections

Micron

Volumn 30, Issue 3, 1999, Pages 227-234

  Verkleij, D ^a   Mulders, C ^a  

^a NXP SEMICONDUCTORS   (Netherlands)

Author keywords

Auger; Failure analysis; Focused ion beam; Integrated circuits; SIMS

Indexed keywords

EID: 0032970359     PISSN: 09684328     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0968-4328(99)00007-4     Document Type: Article

References (4)

1. Crow G., Christman L., Utlaut M. A focused ion beam secondary ion mass spectroscopy system. J. Vac. Sci. Technol. B. 13:(6):1995;2607-2612.
2. + LMIS based FIB instrument. Proceedings of the SIMS X Conference, pp. 517-520.
3. Lee, R., Morgan, J., 1991. Integration of a focused ion beam system in a failure analysis environment. Proceedings of the 17th International Symposium for Testing & Failure Analysis (ISTFA), pp. 85-95.
4. Verkleij, D., Werner, H., Dingle, T., Whitney, J., 1995. Wafer analysis with SIMS using a Focused Ion Beam (FIB). Proceedings of the SIMS X Conference, pp. 907-910.