Properties of atomic layer deposited (Ta1-xNbx)2O5 solid solution films and Ta2O5-Nb2O5 nanolaminates

Journal of Applied Physics

Volumn 86, Issue 10, 1999, Pages 5656-5662

  Kukli, Kaupo ^a,b   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b UNIVERSITY OF TARTU   (Estonia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001174123     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371576     Document Type: Article

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