Atomic layer deposition of SiO2 using catalyzed and uncatalyzed self-limiting surface reactions

Surface Review and Letters

Volumn 6, Issue 3-4, 1999, Pages 435-448

  Klaus, J W ^a   Sneh, O ^a,b   Ott, A W ^a,c   George, S M ^a  

^a UNIVERSITY OF COLORADO   (United States)

^b AIXTRON Inc   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033434176     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1142/s0218625x99000433     Document Type: Article

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