Adsorption and desorption kinetics of H2O on a fully hydroxylated SiO2 surface

Surface Science

Volumn 364, Issue 1, 1996, Pages 61-78

  Sneh, Ofer ^a,b   Cameron, Michelle A ^b   George, Steven M ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b UNIVERSITY OF COLORADO   (United States)

Author keywords

Adsorption isotherms; Adsorption kinetics; Amorphous surfaces; Chemisorption; Insulating films; Laser induced thermal desorption; Laser methods; Models of surface kinetics; Physical adsorption; Silicon oxides; Solid gas interfaces; Thermal desorption; Water

Indexed keywords

ADSORPTION; ADSORPTION ISOTHERMS; CHEMICAL VAPOR DEPOSITION; DESORPTION; INTERFACES (MATERIALS); LASER APPLICATIONS; MEASUREMENTS; REACTION KINETICS; SILICA; THERMAL EFFECTS; THIN FILMS; WATER;

ADSORPTION KINETICS; AMORPHOUS SURFACES; DEPOSITION RATE; DESORPTION KINETICS; HYDROXYLATED SURFACES; LASER INDUCED THERMAL DEPOSITION; SOLID GAS INTERFACES; STICKING COEFFICIENT;

SURFACE PHENOMENA;

EID: 0030211499     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00592-4     Document Type: Article

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