Leakage current and electrical breakdown in metal-organic chemical vapor deposited TiO2 dielectrics on silicon substrates

Applied Physics Letters

Volumn 69, Issue 25, 1996, Pages 3860-3862

  Kim, Hyeon Seag ^a   Gilmer, D C ^b   Campbell, S A ^a   Polla, D L ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

^b University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001158030     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117129     Document Type: Article

References (13)

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