E-gun sputtered and reactive ion sputtered TiO2 thin films for gas sensors

Electron Technology (Warsaw)

Volumn 33, Issue 1, 2000, Pages 89-107

  Edelman, F ^a   Rothshild, A ^a   Komem, Y ^a   Mikhelashvili, V ^a   Chack, A ^a   Cosandey, F ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON GUNS; OPTICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; PRESSURE EFFECTS; SEMICONDUCTING FILMS; SEMICONDUCTING TIN COMPOUNDS; SPUTTER DEPOSITION; THERMAL EFFECTS; THIN FILM DEVICES;

ELECTRON GUN SPUTTERING (EGS); REACTIVE ION SPUTTERING (RIS); SEMICONDUCTOR GAS SENSORS; THIN FILM SENSORS; TIN DIOXIDE;

CHEMICAL SENSORS;

EID: 0033747522     PISSN: 00709816     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (59)