Interfacial reaction in the poly-Si/Ta2O5/TiN capacitor system

Journal of Applied Physics

Volumn 83, Issue 1, 1998, Pages 139-144

  Lee, Hoo Jeong ^a   Sinclair, Robert ^a   Lee, Myeong Bum ^b   Lee, Hyeon Deok ^b  

^a Stanford University   (United States)

^b SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001425625     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366732     Document Type: Article

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