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Volumn 43, Issue 6, 1999, Pages 1095-1099

Processing and characterization of sol-gel deposited Ta2O5 and TiO2-Ta2O5 dielectric thin films

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ELLIPSOMETRY; PERMITTIVITY MEASUREMENT; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SIMULATED ANNEALING; SOL-GELS; TANTALUM COMPOUNDS; THIN FILMS; TITANIUM DIOXIDE;

EID: 0032684609     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(99)00031-3     Document Type: Article
Times cited : (38)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.