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Volumn 31, Issue 9, 2001, Pages 815-824

X-ray photoelectron spectroscopy study of carbon nitride coatings deposited by IR laser ablation in a remote nitrogen plasma atmosphere

(7) Jama, C a Al Khawwam, A a Loir, A S a Goudmand, P a Dessaux, O a Gengembre, L b Grimblot, J b

a UNIV LILLE (France)

b UNITÉ DE CATALYSE ET DE CHIMIE DU SOLIDE (France)

Author keywords

Carbon nitride; Laser ablation; Nitrogen plasma; Valence band; XPS

Indexed keywords

BAND STRUCTURE; CARBON DIOXIDE LASERS; CHEMICAL BONDS; GRAPHITIZATION; INORGANIC COATINGS; PULSED LASER DEPOSITION; SILICON; SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

LONE PAIR ELECTRONS; NITROGEN PLAMSAS;

CARBON NITRIDE;

EID: 0035446293 PISSN: 01422421 EISSN: None Source Type: Journal
DOI: 10.1002/sia.1110 Document Type: Article

Times cited : (25)

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