Structural studies of reactive pulsed laser-deposited CNx films by X-ray photoelectron spectroscopy and infrared absorption

Journal of Materials Science

Volumn 32, Issue 9, 1997, Pages 2347-2352

  Ong, C W ^a   Zhao, X A ^a,b   Tsang, Y C ^a   Choy, C L ^a   Chan, P W ^a  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b SHANGHAI RESEARCH INSTITUTE OF MATERIALS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; AMORPHOUS FILMS; CHEMICAL BONDS; COMPOSITION EFFECTS; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT ABSORPTION; PULSED LASER APPLICATIONS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; REACTIVE PULSED LASER DEPOSITION (RPLD);

CARBON INORGANIC COMPOUNDS;

EID: 0031145304     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1018540704152     Document Type: Article

References (40)

1. A. Y. LIU and M. L. COHEN, Phys. Rev. B 41 (1990) 10727.
2. Idem, Science 245 (1989) 841.
3. Z. M. REN, Y. C. DU, Z. F. YING, Y. X. QUI, X. X. XIONG, J. D. WU and F. M. LI, Appl. Phys. Lett. 65 (1994) 1361.
4. Z. M. REN, Y. C. DU, Y. X. QUI, J. D. WU, Z. F. YING, X. X. XIONG and F. M. LI, Phys. Rev. B 51 (1995) 5274.
5. C. NIU, Y. Z. LU and C. M. LIEBER, Science 261 (1993) 334.
6. J. NARAYAN, J. REDDY, N. BIUNNO, S. K. KANETKAR, P. TIWARI and N. PARIKH, Mater. Sci. Eng. B 26 (1994) 49.
7. H. W. SONG, F. Z. CUI, X. M. HE, W. Z. LI and H. D. LI, J. Phys. Condens. Matter 6 (1994) 6125.
8. D. MARTON, A. H. AL-BAYATI, S. S. TODOROV, K. J. BOYD and J. W. RABALAIS, Nucl. Instrum. Meth. B 90 (1994) 277.
9. D. MARTON, K. J. BOYD, A. H. AL-BAYATI, S. S. TODOROV and J. W. RABALAIS, Phys. Rev. Lett. 73 (1994) 118.
10. H. C. HOFSÄSS, C. RONNING, U. GRIESMEIER and M. GROSS, Mater. Res. Soc. Symp. Proc. 354 (1995) 93.
11. A. BOUSETTA, M. LU, A. BENSAOULA and A. SCHULTZ, Appl. Phys. Lett. 65 (1994) 696.
12. S. KUMAR and T. L. TANSLEY, Solid State Commun. 88 (1993) 803.
13. Idem, J. Appl. Phys. 76 (1994) 4390.
14. K. M. YU, M. L. COHEN, E. E. HALLER, W. L. HANSEN, A. Y. LIU and I. C. WU, Phys. Rev. B 49 (1994) 5034.
15. N. NAKAYAMA, Y. TSUCHIYA, S. TAMADA, K. KOSUGE, S. NAGATA, K. TAKAHIRO and S. YAMAGUCHI, Jpn J. Appl. Phys. 32 (1993) L1465.
16. J. H. KAUFMAN, S. METIN and D. D. SAPERSTEIN, Phys. Rev. B 39 (1989) 13053.
17. J. J. CUOMO, P. A. LEARY, D. YU, W. REUTER and M. FRISCH, J. Vac. Sci. Technol. 16 (1979) 299.
18. H. SJÖSTRÖM, I. IVANOV, M. JOHANSSON, L. HULTMAN, J.-E. SUNDGREN, S. V. HAINSWORTH, T. F. PAGE and L. R. WALLENBERG, Thin Solid Films 246 (1994) 103.
19. J. F. D. CHUBACI, T. SAKAI, T. YAMAMOTA, K. OGATA, A. EBE and F. FUJIMOTO, Nucl. Instrum. Meth. B 80/81 (1993) 463.
20. A. HOFFMAN, I. GOUZMAN and R. BRENER, Appl. Phys. Lett. 64 (1994) 845.
21. X.-A. ZHAO, C. W. ONG, Y. C. TSANG, Y. W. WONG, P. W. CHAN and C. L. CHOY, ibid. 66 (1995) 2652.
22. C. W. ONG, X.-A. ZHAO, J. T. CHEUNG, S. K. LAM, Y. LIU, C. L. CHOY and P. W. CHAN, Thin Solid Films 258 (1995) 34.
23. G. C. SMITH, "Surface Analysis by Electron Spectroscopy" (Plenum Press, New York, 1994) p. 45.
24. J. D. WARNER, J. J. POUCH, S. A. ALTEROVITZ, D. C. LIU and W. A. LANFORD, J. Vac. Sci. Technol. A 3 (1985) 900.
25. T. T. P. CHEUNG, J. Appl. Phys. 53 (1982) 6857.
26. A. MANSOUR and D. UGOLINI, Phys. Rev. B 47 (1993) 10201.
27. T. MORI and Y. NAMBA, J. Appl. Phys. 55 (1984) 3276.
28. F. FUJIMOTO and K. OGATA, Jpn J. Appl. Phys. 32 (1993) L420.
29. G. JOHANSSON, J. HEDMAN, A. BERNDTSSON, M. KLASSON and R. NILSSON, J. Electron Spectrosc. Relat. Phenom. 2 (1973) 295.
30. J. F. MOULDER, W. F. STICKLE, P. E. SOBOL and K. D. BOMBEN, "Handbook of X-ray Photoelectron Spectroscopy", edited by J. Chastain (Perkin-Elmer Corporation, Eden Prairie, 1992) p. 216.
31. U. GELIUS, P. F. HEDEN, J. HEDMAN, B. J. LINDBERG, R. MANNE, R. NORDBERG, C. NORDLING and K. SIEGBAHN, Phys. Scripta 2 (1970) 70.
32. M. BARBER, J. A. CONNOR, M. F. GUEST, I. H. HILLIER, M. SCHWARZ and M. STACEY, J. Chem. Soc. Farad. Trans. II 69 (1973) 551.
33. R. LARSSON and B. FOLKESSON, Chem. Scripta 9 (1976) 148.
34. P. WOOD, T. WYDEVEN and O. TSUJI, Thin Solid Films 258 (1995) 151.
35. D. N. BELTON, S. T. HARRIS, S. J. SCHMIEG, A. M. WEINER and T. A. PERRY, Appl. Phys. Lett. 54 (1989) 416.
36. A. NILSON, O. BJORNEHOLM, H. TILLBORG, B. HERNNAS, R. J. GUEST, A. SANDELL, R. E. PALMER and N. MARTENSSON, Surf. Sci. 287/288 (1993) 758.
37. B. J. LINDBERG and J. HEDMAN, Chem. Scripta 7 (1975) 155.
38. H. BOEHLAND, W. HANAY, A. MEISEL and R. SCHEIBE, Z. Chem. 10 (1981) 372.
39. J. V. SALYN, E. K. ZUMADILOV, V. I. NEFEDOV, R. SCHEIBE, G. LEONHARDT, L. BEYER and E. Z. HOYER, Anorg. Allg. Chem. 432 (1977) A275.
40. P. BRANT and R. D. FELTHAM, J. Organometal. Chem. C 53 (1976) 120.