Carbon nitride CNx film deposition assisted by IR laser ablation in a cold remote nitrogen plasma

Thin Solid Films

Volumn 302, Issue 1-2, 1997, Pages 58-65

  Jama, C ^a   Rousseau, V ^a   Dessaux, O ^a   Goudmand, P ^a  

^a UNIV LILLE   (France)

Author keywords

Carbon nitride; CNx; Cold plasma; Deposition process; Laser ablation

Indexed keywords

CARBON DIOXIDE LASERS; DEPOSITION; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LASER ABLATION; NITRIDES; NITROGEN FIXATION; PRESSURE EFFECTS; RAMAN SPECTROSCOPY; TARGETS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; COLD REMOTE NITROGEN PLASMA; OPTICAL EMISSION SPECTROSCOPY (OES);

AMORPHOUS FILMS;

EID: 0031168072     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09541-7     Document Type: Article

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