X-ray photoelectron spectroscopy characterization of radio frequency reactively sputtered carbon nitride thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 5, 1996, Pages 2687-2692

  Kumar, Sunil ^a,b   Butcher, K S A ^a   Tansley, T L ^a  

^a MACQUARIE UNIVERSITY   (Australia)

^b UNIVERSITY OF NEW ENGLAND   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NITRIDE; ELECTRON PAIRS; RADIO FREQUENCY REACTIVE SPUTTERING;

BINDING ENERGY; CHEMICAL BONDS; COMPOSITION; ELECTRONS; NITROGEN; PLASMAS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

NITRIDES;

EID: 0030245195     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580188     Document Type: Article

References (33)

1. A. Y. Liu and M. L. Cohen, Science 245, 841 (1989).
2. L. Pauling, The Nature of the Chemical Bond (Cornell University Press, New York, 1967).
3. M. Y. Chen, X. Lin, V. P. Dravid, Y. W. Chung, M. S. Wong, and W. D. Sproul, Surf. Coat. Technol. 54/55, 360 (1992).
4. D. Li, Y. W. Chung, M. S. Wong, and W. D. Sproul, J. Appl. Phys. 74, 219 (1993).
5. N. Nakayama, Y. Tsuchiya, S. Tamada, K. Kosuge, S. Nagata, K. Takahiro, and S. Yamaguchi, Jpn. J. Appl. Phys. 32, L1465 (1993).
6. C. J. Torng, J. M. Sivertsen, J. H. Judy, and C. Chang, J. Mater. Res. 5, 2490 (1990).
7. T. Yeh, C. Lin, J. M. Sivertsen, and J. H. Judy, IEEE Trans. Magn. 27, 5163 (1991).
8. S. Kumar and T. L. Tansley, Solid State Commun. 88, 803 (1993).
9. K. M. Yu, M. L. Cohen, E. E. Haller, W. L. Hansen, A. Y. Liu, and I. C. Wu, Phys. Rev. B 49, 5034 (1994).
10. H. Sjostrom et al., Thin Solid Films 246, 103 (1994).
11. S. Kumar and T. L. Tansley, J. Appl. Phys. 76, 4390 (1994).
12. S. Kumar and T. L. Tansley, Thin Solid Films 256, 44 (1995).
13. S. Kumar, T. L. Tansley, and L. S. Wielunski, J. Phys. D 28, 2335 (1995).
14. H. Han and B. J. Feldman, Solid State Commun. 65, 921 (1988).
15. M. Diani, A. Mansour, L. Kubler, J. L. Bischoff, and D. Bolmont, Diam. Relat. Mater. 3, 264 (1994).
16. C. Niu, Y. Z. Lu, and C. M. Lieber, Science 261, 334 (1993).
17. C. M. Lieber and Z. J. Zhang, Adv. Mater. 6, 497 (1994).
18. J. Narayan, J. Reddy, N. Biunno, S. M. Kanetkar, P. Tiwari, and N. Parikh, Mater. Sci. Eng. B 26, 49 (1994).
19. K. Ogata, J. F. D. Chubaci, and F. Fujimoto, J. Appl. Phys. 76, 3791 (1994).
20. J. F. D. Chubaci, T. Sakai, T. Yamamoto, K. Ogata, A. Ebe, and F. Fujimoto, Nucl. Instrum. Methods Phys. Res. B 80/81, 463 (1993).
21. H. W. Song, F. Z. Cui, X. M. He, W. Z. Li, and H. D. Li, J. Phys. Condens. Matter 6, 6125 (1994).
22. F. Rossi et al., Thin Solid Films 253, 85 (1994).
23. D. Marton, K. J. Boyd, A. H. Al-Bayati, S. S. Todorov, and J. W. Rabalais, Phys. Rev. Lett. 73, 118 (1994).
24. J. P. Riviere, D. Texier, J. Delafond, M. Jaouen, E. L. Mathe, and J. Choumont, Mater. Lett. 22, 115 (1995).
25. A. Hoffman, I. Gouzman, and R. Brener, Appl. Phys. Lett. 64, 845 (1994).
26. I. Gouzman, R. Brener, and A. Hoffman, Thin Solid Films 253, 90 (1994).
27. O. Matsumoto, T. Kotaki, H. Shikano, K. Takemura, and S. Tanaka, J. Electrochem. Soc. 141, L16 (1994).
28. J. Kouvetakis, A. Bandari, M. Todd, B. Wilkens, and N. Cave, Chem. Mater. 6, 811 (1994).
29. I. Bello, W. M. Lau, R. P. W. Lawson, and K. K. Foo, J. Vac. Sci. Technol. A 10, 1642 (1992).
30. J. F. Moulder, W. F. Suckle, P. E. Sobolad, and K. D. Bomben, Handbook of X-Ray Photoelectron Spectroscopy (Perkin-Elmer Corporation, Minnesota, 1992).
31. B. J. Lindberg and J. Hedman, Chem. Scr. 7, 155 (1975).
32. T. Matsui, M. Yudasaka, R. Kikuchi, Y. Ohki, and S. Yoshimura, Mater. Sci. Eng. B 29, 220 (1995).
33. A. Y. Liu and M. L. Cohen, Phys. Rev. B 41, 10 727 (1990).