Study of Amorphous Carbon Nitride Films by X-ray Photoelectron Spectroscopy

Surface Science Spectra

Volumn 6, Issue 3, 1999, Pages 161-167

  Chen, Dihu ^a   Wei, Aixing ^a   Wong, S P ^b   Peng, Shaoqi ^a   Kwok, R W M ^b  

^a SUN YAT SEN UNIVERSITY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; CARBON NITRIDE; PHOTOELECTRONS; PHOTONS; SURVEYS; TANTALUM COMPOUNDS;

AMORPHOUS CARBON NITRIDE FILMS; ENERGY; HIGH RESOLUTION SCANS; ION SPUTTERING; MEASUREMENTS OF; MONOCHROMATICS; PHOTOELECTRON PEAKS; SPECTRA'S; SPECTROSCOPY MEASUREMENTS; SURFACE CONTAMINATIONS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 54949138686     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/1.1247923     Document Type: Article

References (4)

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2. A. Y.Liu and M. L.Cohen, Science 245, 841 (1989). 10.1126/science.245.4920.841
3. AixingWei, DihuChen, NingKe, ShaoqiPeng, and S. P.Wong, J. Phys. D: Appl. Phys. 31, 1522 (1998). 10.1088/0022-3727/31/13/005
4. W. T.Zhang, H.Sjostrom, I.Ivanov, K. Z.Xing, E.Broitman, W. R.Sallaneck, J. E.Greene, and J. E.Sundgren, J. Vac. Sci. Technol. A 14, 2696 (1996). 10.1116/1.580190