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Journal of Materials Science

Volumn 32, Issue 11, 1997, Pages 2849-2853

Deposition of CNx thin films by plasma-activated chemical vapour deposition using various precursors as carbon source

(4) Gruger H a Selbmann, D a Wolf, E a Leonhardt, A a

a IFW DRESDEN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACETYLENE; CARBON MONOXIDE; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; ETHYLENE; METHANE; PLASMA APPLICATIONS; STOICHIOMETRY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

PLASMA ACTIVATED CHEMICAL VAPOR DEPOSITION; TETRACYANOETHYLENE;

NITRIDES;

EID: 0031170068 PISSN: 00222461 EISSN: None Source Type: Journal
DOI: 10.1023/A:1018620416389 Document Type: Article

Times cited : (11)

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