XPS, XANES and ToF-SIMS characterization of reactively magnetron-sputtered carbon nitride films

Surface and Interface Analysis

Volumn 25, Issue 10, 1997, Pages 827-835

  Lopez, S ^a   Dunlop, H M ^a   Benmalek, M ^a   Tourillon, G ^b   Wong, M S ^c   Sproul, W D ^c  

^a ALCAN INTERNATIONAL LIMITED   (Canada)

^b UNIVERSITÉ PARIS SACLAY   (France)

^c NORTHWESTERN UNIVERSITY   (United States)

Author keywords

AES; Carbon nitride; Hybridization; Magnetron sputtered film; PVD; ToF SIMS; XANES; XPS

Indexed keywords

ATOMS; AUGER ELECTRON SPECTROSCOPY; FILMS; GRAPHITE; IONIZATION; MAGNETRON SPUTTERING; PLASMAS; SECONDARY ION MASS SPECTROMETRY; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; PLASMA IONIZATION; X RAY ABSORPTION NEAR EDGE STRUCTURE;

NITRIDES;

EID: 0031232857     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199709)25:10<827::AID-SIA331>3.0.CO;2-W     Document Type: Article

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