Bonding structure in carbon nitride films: Variation with nitrogen content and annealing temperature

Surface and Coatings Technology

Volumn 112, Issue 1-3, 1999, Pages 133-139

  Chowdhury, A K M S ^a   Cameron, D C ^a   Hashmi, M S J ^a  

^a DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

Bonding; Carbon nitride; XPS

Indexed keywords

ANNEALING; CHEMICAL BONDS; LIGHT ABSORPTION; LIGHT MEASUREMENT; NITROGEN; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE;

NITRIDES;

EID: 0033076936     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00761-0     Document Type: Article

References (26)

1. Liu A.Y., Cohen M.L. Science. 245:1989;841.
2. Liu A.Y., Cohen M.L. Phys. Rev. B. 41:1990;10727.
3. Kola P.V., Cameron D.C., Meenan B.J., Pischow K.A., Anderson C.A., Brown N.M.D., Hashmi M.S.J. Surf. Coat. Technol. 74 75:1995;696.
4. Nakayama N., Tsuchiya Y., Tamada S., Kosuge K., Nagata S., Takahiro K., Yamaguchi S. Jpn J. Appl. Phys. 32:1993;L1465.
5. Zhang Z.J., Fan S., Huang J., Lieber C.M. J. Elec. Mater. 25:1996;57.
6. Zhang Z.J., Fan S., Lieber C.M. Appl. Phys. Lett. 26:1995;3582.
7. Maya L., Cole D.R., Hagaman E.W. J. Am. Ceram. Soc. 74:1991;1686.
8. Marton D., Boyd K.J., W Rabalais J. Int. J. Modern Phys. B. 9(27):1995;3527.
9. Lopez S., Dunlop H.M., Benmalek M., Tourillon G., Wong M.-S., Sproul W.D. Surf. Interface Anal. 25:1997;315-323.
10. Nilson A., Bjorneholm O., Tillborg H., Hernnas B., Guest R.J., Sandell A., Palmer R.E., Martensson N. Surf. Sci. 287/288:1993;758.
11. Baker M.A., Hammer P. Surf. Interface Anal. 25:1997;301-314.
12. Marton D., Boyd K.J., Al-Bayati A.H., Todorov S.S., Rabalais J.W. Phys. Rev. Lett. 73(1):1994;118.
13. Kohzaki M., Matsumuro A., Hayashi T., Muramatsu M., Yamaguchi K. Jpn. J. Appl. Phys. 36:1997;2313-2318.
14. Hammer P., Baker M.A., Lenardi C., Gissler W. J. Vac. Sci. Technol. A. 15(1):1997;107.
15. Barber M., Conner J.A., Guest M.F., Hillier I.H., Schwartz M., Stacey M. J. Chem. Soc. Faraday Trans. II. 69:1973;551.
16. Chowdhury A.K.M.S., Monclus M., Cameron D.C., Gilvarry J., Murphy M.J., Barradas N.P., Hashmi M.S.J. Thin Solid Films. 308/309:1997;130-134.
17. Zheng W.T., Sjostrom H., Ivanov I., Xing K.Z., Broitman E., Salaneck W.R., Greene J.E., Sundgren J.-E. J. Vac. Sci. Technol. A. 14(5):1996;2696.
18. Gouzman I., Brener R., Hoffman A. Surf. Sci. 331/332/333:1995;283.
19. Rossi F., Andre B., van Veen A., Mijnarends P.E., Schut H., Labohm F., Delplancke M.P., Dunlop H., Anger E. Thin Solid Films. 253:1994;85.
20. Kaufman J.H., Metin S., Saperstein D.D. Phys. Rev. B. 39(18):1989;13053.
21. Kumar S., Tansley T.L. Thin Solid Films. 256:1995;44.
22. Seo S.C., Ingram D.C., Richardson H.H. J. Vac. Sci. Technol. A. 13(6):1995;2856.
23. Wixtom M.R. J. Am. Ceram. Soc. 73:1990;1973.
24. N.N. Greenwood, A. Earnshaw, Chemistry of the Elements, 1st ed., Pergamon Press, New York, 1984.
25. Bar T.L., Yin M.P. J. Vac. Sci. Technol. A. 10:1992;2788.
26. Dillon R.O., Woollam J.A., Katkanant V. Phys. Rev. B. 29(6):1984;3482.