Deposition of micro-crystalline β-C3N4 films by an inductively-coupled-plasma (ICP) sputtering method

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 6 A, 1998, Pages

  Hsu, Chia Yuan ^a   Hong, Franklin Chau Nan ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CRYSTALS; DISSOCIATION; ELECTRON DIFFRACTION; EMISSION SPECTROSCOPY; NITRIDES; PLASMA APPLICATIONS; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; INDUCTIVELY COUPLED PLASMA SPUTTERING;

SEMICONDUCTING FILMS;

EID: 0032092692     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.l675     Document Type: Article

References (27)