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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1361-1366

Etching of high-k dielectric Zr1-xAlxOy films in chlorine-containing plasmas

(9) Pelhos, K a Donnelly, V M a Kornblit, A a Green, M L a van dover, R B a Manchanda, L a Hu, Y a Morris, M a Bower, E a

a AGERE SYSTEMS (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; DIELECTRIC FILMS; ETCHING; INTERFACES (MATERIALS); IONS; RESONATORS; SPUTTERING; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM COMPOUNDS;

HELICAL RESONATORS;

PLASMAS;

EID: 0035392007 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1349721 Document Type: Article

Times cited : (84)

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