Inductively coupled plasma etching of CoFeB, CoZr, CoSm and FeMn thin films in interhalogen mixtures

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 60, Issue 2, 1999, Pages 107-111

  Cho, H ^a   Jung, K B ^a   Hays, D C ^a   Hahn, Y B ^a   Feng, T ^a   Park, Y D ^a   Childress, J R ^b   Cadieu, F J ^c   Rani, R ^c   Qian, X R ^c   Chen, L ^c   Pearton, S J ^a  

^a University of Florida   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c CITY UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT ALLOYS; DESORPTION; IODINE COMPOUNDS; IRON ALLOYS; MAGNETIC PROPERTIES; MAGNETIC STORAGE; METALLIC SUPERLATTICES; PLASMA ETCHING;

IODINE BROMIDE; IODINE CHLORIDE; ION FLUX; PLASMA DISCHARGES;

MAGNETIC THIN FILMS;

EID: 0032632477     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00035-5     Document Type: Article

References (14)

1. Baibich M.N., Broto J.M., Fert A., Van Nguyer F., Petroff F., Eitenne P., Creuzet G., Friederich A., Chazelas J. Phys. Rev. Lett. 61:1988;2472.
2. White R. IEEE Trans. Magn. 28:1992;2482.
3. Daughton J.M., Bade P., Jenson M., Rahmani M. IEEE Trans. Magn. 28:1992;2488.
4. Tsang C.H., Fontana R.E. Jr., Lin T., Heim D.E., Gurney B.A., Williams M.L. IBM. J. Res. Devol. 42:1998;103.
5. Bland J.A.C., Heinrich B. Ultra thin magnetic structures. I and II:1994;Springer-Verlag, Berlin.
6. Tsang C., Santini H., McCown D., Lo J., Lee R. IEEE Trans. Magn. 32:1996;7.
7. Wang J.J., Childress J.R., Sharifi F., Dahmen K.H., Gillman E.S., Cadieu F.J., Rani R., Qian X.R., Chen L. J. Electrochem. Soc. 145:1998;2512.
8. Jung K.B., Lambers E.S., Childress J.R., Pearton S.J., Jenson M., Hurst A.T. Jr. Appl. Phys. Lett. 71:1997;1255.
9. Jung K.B., Lambers E.S., Childress J.R., Pearton S.J., Jenson M., Hurst A.T. Jr. J. Vac. Sci. Technol. A13:1998;1697.
10. Osaka T., Homma T., Saito K., Takekoshi A., Yamazuki Y., Namikawa T. J. Electrochem. Soc. 139:1992;1311.
11. Jimbo M., Komiyama K., Tsunashima S. J. Appl. Phys. 79:1996;6237.
12. Caballero J.A., Geerts W.J., Petroff F., Thiele J.-U., Weller D., Childress J.R. J. Magn. Mag. Mat. 177-181:1998;1229.
13. K.B. Jung, H. Cho, Y.B. Hahn, D.C. Hays, T. Feng, Y.D. Park, J.R. Childress, S.J. Pearton, Mat. Sci. Eng. B. 60 (1999).
14. Popov O.A. high density plasma sources. 1996;Noyes Publications, Park Ridge NJ.