Low-energy Ar ion-induced and chlorine ion etching of silicon

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 1, 1996, Pages 229-233

  Balooch, M ^a   Moalem, M ^a   Wang, Wei E ^a   Hamza, A V ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030550099     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.579924     Document Type: Article

References (20)

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