-
2
-
-
0026869745
-
-
E. F. Crabbe, J. H. Comfort, W. Lee, J. D. Cressler, B. S. Meyerson, A. C. Megdanis, J. Y. C. Sun, and J. M. C. Stork, IEEE Electron Device Lett. 13, 259 (1992).
-
(1992)
IEEE Electron Device Lett.
, vol.13
, pp. 259
-
-
Crabbe, E.F.1
Comfort, J.H.2
Lee, W.3
Cressler, J.D.4
Meyerson, B.S.5
Megdanis, A.C.6
Sun, J.Y.C.7
Stork, J.M.C.8
-
4
-
-
0000045079
-
-
R. Hull, J. C. Bean, D. J. Werder, and R. H. Leibenguth, Appl. Phys. Lett. 52, 1605 (1988).
-
(1988)
Appl. Phys. Lett.
, vol.52
, pp. 1605
-
-
Hull, R.1
Bean, J.C.2
Werder, D.J.3
Leibenguth, R.H.4
-
6
-
-
22644451114
-
-
R. Sharma, J. L. Fretwell, T. Ngai, and S. Banerjee, J. Vac. Sci. Technol. B 17, 460 (1999).
-
(1999)
J. Vac. Sci. Technol. B
, vol.17
, pp. 460
-
-
Sharma, R.1
Fretwell, J.L.2
Ngai, T.3
Banerjee, S.4
-
7
-
-
0032266791
-
-
H. F. Luan, B. Z. Wu, L. G. Kang, B. Y. Kim, R. Vrtis, D. Roberts, and D. L. Kwong, Tech. Dig. Int. Electron Devices Meet., 609 (1998).
-
(1998)
Tech. Dig. Int. Electron Devices Meet.
, pp. 609
-
-
Luan, H.F.1
Wu, B.Z.2
Kang, L.G.3
Kim, B.Y.4
Vrtis, R.5
Roberts, D.6
Kwong, D.L.7
-
8
-
-
0032254848
-
-
R. B. van Dover, R. M. Fleming, L. F. Schneemeyer, G. B. Alers, and D. J. Werder, Tech. Dig. Int. Electron Devices Meet., 823 (1998).
-
(1998)
Tech. Dig. Int. Electron Devices Meet.
, pp. 823
-
-
Van Dover, R.B.1
Fleming, R.M.2
Schneemeyer, L.F.3
Alers, G.B.4
Werder, D.J.5
-
9
-
-
0032255794
-
-
D. Park, Q. Lu, T. J. Ling, C. Hu, A. Kalnitsky, S. Tay, and C. C. Cheng, Tech. Dig. Int. Electron Devices Meet., 381 (1998).
-
(1998)
Tech. Dig. Int. Electron Devices Meet.
, pp. 381
-
-
Park, D.1
Lu, Q.2
Ling, T.J.3
Hu, C.4
Kalnitsky, A.5
Tay, S.6
Cheng, C.C.7
-
10
-
-
0031236156
-
-
J. L. Autran, R. Devine, C. Chaneliere, and B. Balland, IEEE Electron Device Lett. 18, 447 (1997).
-
(1997)
IEEE Electron Device Lett.
, vol.18
, pp. 447
-
-
Autran, J.L.1
Devine, R.2
Chaneliere, C.3
Balland, B.4
-
11
-
-
0032256248
-
-
X. Guo, T. P. Ma, T. Tamagawa, and B. L. Halpern, Tech. Dig. Int. Electron. Devices Meet., 377 (1998).
-
(1998)
Tech. Dig. Int. Electron. Devices Meet.
, pp. 377
-
-
Guo, X.1
Ma, T.P.2
Tamagawa, T.3
Halpern, B.L.4
-
12
-
-
0032279435
-
-
B. He, T. Ma, S. A. Campbell, and W. L. Gladfelter, Tech. Dig. Int. Electron Devices Meet., 1038 (1998).
-
(1998)
Tech. Dig. Int. Electron Devices Meet.
, pp. 1038
-
-
He, B.1
Ma, T.2
Campbell, S.A.3
Gladfelter, W.L.4
-
15
-
-
85037520325
-
-
to be published
-
W. J. Qi, R. Nieh, B. H. Lee, L. Kang, Y. Jeon, K. Onishi, T. Ngai, S. Banerjee, and J. C. Lee, Tech. Dig. Int. Electron Devices Meet. (to be published).
-
Tech. Dig. Int. Electron Devices Meet.
-
-
Qi, W.J.1
Nieh, R.2
Lee, B.H.3
Kang, L.4
Jeon, Y.5
Onishi, K.6
Ngai, T.7
Banerjee, S.8
Lee, J.C.9
-
17
-
-
0020175936
-
-
J. Perrière, J. Siejka, and R. P. H. Chang, Thin Solid Films 95, 309 (1982).
-
(1982)
, vol.95
, pp. 309
-
-
Perrière, J.1
Siejka, J.2
Chang, R.P.H.3
Films, T.S.4
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