Surface patterning and its application in wetting/dewetting studies

Current Opinion in Colloid and Interface Science

Volumn 6, Issue 1, 2001, Pages 54-64

  Xia, Younan ^a   Qin, Dong ^a   Yin, Yadong ^b  

^a UNIVERSITY OF WASHINGTON   (United States)

^b University of Washington   (United States)

Author keywords

Dewetting; Self assembled monolayers; Soft lithography; Surface patterning; Wetting

Indexed keywords

CHEMICAL STRUCTURE; DEVICE; LIQUID; MATERIALS; MOLECULAR DYNAMICS; MOLECULAR INTERACTION; MOLECULAR MODEL; MOLECULAR SIZE; PHYSICAL CHEMISTRY; PRINTING; REVIEW; SOLID; STUDY; SURFACE PROPERTY; WETTABILITY;

EID: 0035081345     PISSN: 13590294     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-0294(00)00088-1     Document Type: Review

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