Using elastomeric membranes as dry resists and for dry lift-off

Langmuir

Volumn 15, Issue 8, 1999, Pages 2973-2984

  Jackman, Rebecca J ^a   Duffy, David C ^a   Cherniavskaya, Oksana ^a   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; ELASTOMERS; PHOTOLITHOGRAPHY; PHOTORESISTS; SURFACE PHENOMENA;

DRY LIFT OFF; DRY RESISTS; ELASTOMERIC MEMBRANES;

POLYMERIC MEMBRANES;

EID: 0345237255     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la981591y     Document Type: Article

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