Maskless photolithography: Embossed photoresist as its own optical element

Applied Physics Letters

Volumn 73, Issue 20, 1998, Pages 2893-2895

  Paul, Kateri E ^a   Breen, Tricia L ^a   Aizenberg, Joanna ^a   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; LENSES; OPTICAL DEVICES; PHOTOLITHOGRAPHY; SURFACES; THIN FILMS; ULTRAVIOLET RADIATION;

CURVED FEATURES; MASKLESS PHOTOLITHOGRAPHY; SQUARE PYRAMIDAL STRUCTURES;

PHOTORESISTS;

EID: 0032538713     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122621     Document Type: Article

References (10)

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3. Y. Xia and G. M. Whitesides, Angew. Chem. Int. Ed. Engl. 37, 550 (1998).
4. W. M. Moreau, Semiconductor Lithography (Plenum, New York, 1998), pp. 607-617.
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8. J. Aizenberg, J. A. Rogers, K. E. Paul, and G. M. Whitesides, Appl. Phys. Lett. 71, 3773 (1997).
9. The mold for the latter sample was prepared by casting PDMS against a master prepared by embossing a 1200 lines/mm holographic grating on a layer of photoresist, exposing it to UV light and reactive ion etching.
10. D. M. Byrne, A. J. Brouns, F. C. Case, R. C. Tiberio, B. L. Whitehead, and E. D. Wolf, J. Vac. Sci. Technol. B 3, 268 (1985).