메뉴 건너뛰기




Volumn 44, Issue 9, 1997, Pages 1425-1431

Study of the effects of a stepped doping profile in short-channel mosfet's

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; INTERFACES (MATERIALS); MONTE CARLO METHODS; SEMICONDUCTOR DOPING;

EID: 0031232942     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.622597     Document Type: Article
Times cited : (22)

References (23)
  • 2
    • 0026994246 scopus 로고    scopus 로고
    • 70 nm gate length MOSFET with double punchthrough stopped structure," in Ext. Abst. Int. Conf. Solid State Devices Materials, Aug. 1992, pp. 490-4192.
    • T. Hashimoto, Y. Sudoh, H. Kurino, A. Narai, S. Yokoyama, Y. Horiike, and M. Koyanagi, "3 V operation of 70 nm gate length MOSFET with double punchthrough stopped structure," in Ext. Abst. Int. Conf. Solid State Devices Materials, Aug. 1992, pp. 490-4192.
    • Y. Sudoh, H. Kurino, A. Narai, S. Yokoyama, Y. Horiike, and M. Koyanagi, "3 v Operation of
    • Hashimoto, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.