Comparison of unbalanced magnetron sputtering and filtered arc evaporation for the preparation of films onto insulating substrates

Vacuum

Volumn 49, Issue 2, 1998, Pages 75-79

  Mustapha, N ^a   Howson, R P ^a  

^a LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM; COPPER; ELECTRIC INSULATING MATERIALS; EVAPORATION; ION BOMBARDMENT; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; REACTION KINETICS; SUBSTRATES; TITANIUM; TITANIUM NITRIDE;

FILTERED ARC EVAPORATION; INSULATING SUBSTRATE; UNBALANCED MAGNETRON SPUTTERING;

FILM PREPARATION;

EID: 0031988421     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00011-0     Document Type: Article

References (13)

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