Properties of carbon ion deposited tetrahedral amorphous carbon films as a function of ion energy

Journal of Applied Physics

Volumn 79, Issue 9, 1996, Pages 7234-7240

  Shi, Xu ^a   Tay, B K ^a   Tan, H S ^a   Zhong, Li ^a   Tu, Y Q ^a   Silva, S R P ^b   Milne, W I ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006413423     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361440     Document Type: Article

References (23)

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