Optical properties of CNx films prepared by filtered arc deposition

Materials Letters

Volumn 33, Issue 1-2, 1997, Pages 85-89

  Chen, Z Y ^a   Zhao, J P ^a   Yu, Y H ^a   Wang, X ^a   Yang, S Q ^a   Shi, T S ^a   Liu, X H ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

CNx; Filtered arc deposition; Optical properties; Thin films

Indexed keywords

CARBON; DENSITY (SPECIFIC GRAVITY); DEPOSITION; ENERGY GAP; LIGHT REFLECTION; NITRIDES; OPTICAL PROPERTIES; PLASMA APPLICATIONS; QUARTZ; SILICON WAFERS; THIN FILMS; TITANIUM;

FILTERED ARC DEPOSITION;

OPTICAL FILMS;

EID: 0031268698     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(97)00073-6     Document Type: Article

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