Recent progress in filtered vacuum arc deposition

Surface and Coatings Technology

Volumn 86-87, Issue PART 1, 1996, Pages 243-253

  Boxman, R L ^a   Zhitomirsky, V ^a   Alterkop, B ^a   Gidalevich, E ^a   Beilis, I ^a   Keidar, M ^a   Goldsmith, S ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

Filtered vacuum arc deposition

Indexed keywords

COATINGS; ELECTRIC FIELDS; ELECTRONS; GEOMETRY; IONS; MAGNETIC FIELDS; MATHEMATICAL MODELS; ROTORS; VACUUM APPLICATIONS;

CENTRIFUGAL FORCE; CHARGE SEPARATION; FILTERED ARC SOURCES; FILTERED VACUUM ARC DEPOSITION; MAGNETIC FIELD STRENGTH; PLASMA TRANSPORT EFFICIENCY;

DEPOSITION;

EID: 4043127038     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)03023-X     Document Type: Article

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