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Volumn 3, Issue 1, 1998, Pages 38-44

Ballistic-electron-emission microscopy of semiconductor heterostructures

Author keywords

BEEM ballistic electron emission microscopy; M S metal semiconductor; STM scanning tuneling microscopy

Indexed keywords


EID: 0004400630     PISSN: 13590286     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-0286(98)80063-6     Document Type: Article
Times cited : (3)

References (44)
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    • Ballistic-electron-emission microscopy study of transport in GaN thin films
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    • Fermi level pinning position at the Au-lnAs interface determined using ballistic-electron emission microscopy
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    • 2/Si. Suppression of BEEM transmission was observed in areas which had been charged by the STM tip. An increase in BEEM threshold voltage was also observed in these areas.
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    • Gate oxide characterization with ballistic-electron-emission microscopy
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    • 2 by ballistic-electron-emission spectroscopy
    • 2 layers. By comparing Monte Carlo calculations to experimental spectra, breakdown of the oxide was found to be much more difficult to achieve than expected. The implication was that impurities or defects, rather than an intrinsic material limit, are responsible for breakdowns observed in devices.
    • 2 layers. By comparing Monte Carlo calculations to experimental spectra, breakdown of the oxide was found to be much more difficult to achieve than expected. The implication was that impurities or defects, rather than an intrinsic material limit, are responsible for breakdowns observed in devices.
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