Structural and electrical properties of Fe-doped TiO2 thin films

Journal of Physics D: Applied Physics

Volumn 31, Issue 10, 1998, Pages 1149-1154

  Bally, A R ^a   Korobeinikova, E N ^b   Schmid, P E ^a   Levy F ^a   Bussy, F ^c  

^a EPFL   (Switzerland)

^b Institute of Crystallography   (Russian Federation)

^c UNIVERSITY OF LAUSANNE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY MEASUREMENT; IRON; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); TITANIUM DIOXIDE;

ELECTRICAL POWER MEASUREMENT; IRON DOPING; STRUCTURAL TRANSFORMATION; THERMOELECTRIC POWER MEASUREMENT;

THIN FILMS;

EID: 0032074014     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/31/10/004     Document Type: Article

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