MOCVD TiO2 thin-film doping with microwave PECVD TiC and ZrO2

Materials Chemistry and Physics

Volumn 47, Issue 2-3, 1997, Pages 193-197

  Lee, C H ^a   Ching, C W ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Microwave PECVD; MOCVD; TiC doping; TiO2

Indexed keywords

CURRENT DENSITY; DOPING (ADDITIVES); GRAIN GROWTH; HIGH TEMPERATURE EFFECTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROWAVES; NANOSTRUCTURED MATERIALS; PERMITTIVITY; PLASMA APPLICATIONS; THIN FILMS; TITANIUM CARBIDE; ZIRCONIA;

DOPANTS; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

TITANIUM OXIDES;

EID: 0031071790     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(97)80050-8     Document Type: Article

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